A New Highly Anisotropic Rh‐Based Heusler Compound for Magnetic Recording

Summary

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Authors: Yangkun He, Gerhard H. Fecher, Chenguang Fu, Yu Pan, Kaustuv Manna, Johannes Kroder, Ajay Jha, Xiao Wang, Zhiwei Hu, Stefano Agrestini, Javier Herrero‐Martín, Manuel Valvidares, Yurii Skourski, Walter Schnelle, Plamen Stamenov, Horst Borrmann, Liu Hao Tjeng, Rudolf Schaefer, Stuart S. P. Parkin, John Michael D. Coey, Claudia Felser

Journal title: Advanced Materials

Journal number: 32/45

Journal publisher: United Nations Industrial Developement Organization

Published year: 2020

Published pages: 2004331

DOI identifier: 10.1002/adma.202004331

ISSN: 0935-9648