Contact resistance at graphene/MoS 2 lateral heterostructures

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Authors: M. Houssa, K. Iordanidou, A. Dabral, A. Lu, R. Meng, G. Pourtois, V. V. Afanas'ev, A. Stesmans

Journal title: Applied Physics Letters

Journal number: 114/16

Journal publisher: American Institute of Physics

Published year: 2019

Published pages: 163101

DOI identifier: 10.1063/1.5083133

ISSN: 0003-6951