Reliability of scalable MoS 2 FETs with 2 nm crystalline CaF 2 insulators

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Authors: Yury Yu Illarionov, Alexander G Banshchikov, Dmitry K Polyushkin, Stefan Wachter, Theresia Knobloch, Mischa Thesberg, Mikhail I Vexler, Michael Waltl, Mario Lanza, Nikolai S Sokolov, Thomas Mueller, Tibor Grasser

Journal title: 2D Materials

Journal number: 6/4

Journal publisher: IOP Publishing

Published year: 2019

Published pages: 045004

DOI identifier: 10.1088/2053-1583/ab28f2

ISSN: 2053-1583