Morphological and stoichiometric optimization of Cu2O thin films by deposition conditions and post-growth annealing

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Authors: Medina Umar, Milo Y. Swinkels, Marta De Luca, Claudia Fasolato, Lucas Moser, Gerard Gadea, Laurent Marot, Thilo Glatzel, Ilaria Zardo

Journal title: Thin Solid Films

Journal number: 138763

Journal publisher: Elsevier Sequoia

Published year: 2021

DOI identifier: 10.1016/j.tsf.2021.138763

ISSN: 0040-6090