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Authors: Y. Hao, L.F. Pasteka, L. Visscher, P. Aggarwal, H.L. Bethlem, A. Boeschoten, A. Borschevsky, M. Denis, K. Esajas, S. Hoekstra, K. Jungmann, V.R. Marshall, Th.B. Meijknecht, M.C. Mooij, R.G.E. Timmermans, A. Touwen, W. Ubachs, L. Willmann, Y. Yin, A. Zapara
Journal title: Journal of Chemical Physics
Journal number: 151
Journal publisher: American Institute of Physics
Published year: 2019
Published pages: 034302
DOI identifier: 10.1063/1.5098540
ISSN: 0021-9606