Sub-10 nm electron and helium ion beam lithography using a recently developed alumina resist

This is a publication. If there is no link to the publication on this page, you can try the pre-formated search via the search engines listed on this page.

Authors: Andrea Cattoni, Dominique Mailly, Olivier Dalstein, Marco Faustini, Gediminas Seniutinas, Benedikt Rösner, Christian David

Journal title: Microelectronic Engineering

Journal number: 193

Journal publisher: Elsevier BV

Published year: 2018

Published pages: 18-22

DOI identifier: 10.1016/j.mee.2018.02.015

ISSN: 0167-9317