Comparative study of resists and lithographic tools using the Lumped Parameter Model

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Authors: Roberto Fallica, Robert Kirchner, Yasin Ekinci, Dominique Mailly

Journal title: Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena

Journal number: 34/6

Journal publisher: AVS Science and Technology Society

Published year: 2016

Published pages: 06K702

DOI identifier: 10.1116/1.4967183

ISSN: 2166-2754