Summary
FM ultra-thin films (0.4 to 1nm thick) such as archetypical CoFeB and Co will be grown by magnetron sputtering on a variety of buffer layers with high spin-orbit coupling like Ta, Pt and W [Singulus]. Thicker elemental ferromagnetic layers (Fe, Co) (1-few nm thick) will be e-beam evaporated in direct contact with oxides (from T1.2) [CNR]. These materials will be in-situ covered with oxide 1, with high ion mobility and grown by sputtering or ALD such as HfO2 and GdOx [Singulus, CNR, CEITEC]. Oxide 2, with high dielectric constant and insulating properties will be grown ex-situ by ALD on oxide 1. Oxide 2 materials: HfO2, HfO2: Al, TiO2 and Al2O3 [CNR, UPSaclay].
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