Phosphorous and Aluminum Implantation for MOSFET Manufacturing: Revisiting Implantation Dose Rate and Subsequent Surface Morphology

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Authors: Woerle, J., Belanche, M., Negri, M., Lamontagne, C., Bonafe, F., Nipoti, R., Grossner, U.

Journal title: Materials Science Forum

Journal publisher: Materials Science Forum

Published year: 2022