TEM sample preparation of lithographically patterned permalloy nanostructures on silicon nitride membranes

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Authors: Joshua Williams, Michael I Faley, Joseph Vimal Vas, Peng-Han Lu, Rafal E Dunin-Borkowski

Journal title: Beilstein Journal of Nanotechnology

Journal number: 15

Journal publisher: Beilstein-Institut Zur Forderung der Chemischen Wissenschaften

Published year: 2024

Published pages: 1-12

DOI identifier: 10.3762/bjnano.15.1

ISSN: 2190-4286