Very large remanent polarization in ferroelectric Hf 1-x Zr x O 2 grown on Ge substrates by plasma assisted atomic oxygen deposition

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Authors: C. Zacharaki, P. Tsipas, S. Chaitoglou, S. Fragkos, M. Axiotis, A. Lagoyiannis, R. Negrea, L. Pintilie, A. Dimoulas

Journal title: Applied Physics Letters

Journal number: 114/11

Journal publisher: American Institute of Physics

Published year: 2019

Published pages: 112901

DOI identifier: 10.1063/1.5090036

ISSN: 0003-6951