Origin of Ferroelectric Phase in Undoped HfO 2 Films Deposited by Sputtering

Summary

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Authors: Terence Mittmann, Monica Materano, Patrick D. Lomenzo, Min Hyuk Park, Igor Stolichnov, Matteo Cavalieri, Chuanzhen Zhou, Ching‐Chang Chung, Jacob L. Jones, Thomas Szyjka, Martina Müller, Alfred Kersch, Thomas Mikolajick, Uwe Schroeder

Journal title: Advanced Materials Interfaces

Journal publisher: Wiley Online Library

Published year: 2019

Published pages: 1900042

DOI identifier: 10.1002/admi.201900042

ISSN: 2196-7350