Reactive Radical Etching of Quartz by Microwave Activated CH₄/H₂ Plasmas Promotes Gas Phase Nanoparticle Formation

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Authors: Michael N. R. Ashfold, Basile F. E. Curchod, Daniel Hollas, Jie Ma, Yuri A. Mankelevich

Journal title: The Journal of Physical Chemistry A

Journal number: 128

Journal publisher: American Chemical Society

Published year: 2024

Published pages: 10884-10905

DOI identifier: 10.1021/acs.jpca.4c05787

ISSN: 1089-5639