The Evolvement of Lithography Optics Towards Advanced EUV Lithography: Enabling the Continuation of Moore’s Law for Six Decades

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Authors: Winfried Kaiser

Journal title: IEEE Electron Devices Magazine

Journal number: 2

Journal publisher: IEEE

Published year: 2024

Published pages: 23-34

DOI identifier: 10.1109/med.2023.3343627

ISSN: 2832-7691