Advances in modeling and optimization for two-photon lithography

Summary

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Authors: Valeriia Sedova, Florie Ogor, Joël Rovera, Odysseas Tsilipakos, Jonas Wiedenmann, Kevin Heggarty, Andreas Erdmann

Journal title: Journal of Micro/Nanopatterning, Materials, and Metrology

Journal number: 24

Journal publisher: SPIE-Intl Soc Optical Eng

Published year: 2025

DOI identifier: 10.1117/1.JMM.24.2.023001

ISSN: 2708-8340