On the impact of atomic layer deposition processing on the chemical and opto-electrical properties of NiO thin films

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Authors: Kousumi Mukherjee, Cristian van Helvoirt, Christ H. L. Weijtens, Marcel Verheijen, Mariadriana Creatore

Journal title: Journal of Vacuum Science & Technology A

Journal number: 43

Journal publisher: American Vacuum Society

Published year: 2025

DOI identifier: 10.1116/6.0004826

ISSN: 0734-2101