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Authors: Lukas Seib, Matthias Krusemark, Clemens Lehr, Max Ohagen, Hung Pham, Markus Schedel, Bastian Welsch, Ingo Sass
Journal title: Applied Thermal Engineering
Journal number: 273
Journal publisher: Elsevier BV
Published year: 2025
DOI identifier: 10.1016/J.APPLTHERMALENG.2025.126322
ISSN: 1359-4311