Scatterometry-informed machine learning study to determine bi-directional intercorrelation of adjacent patterning steps

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Authors: Padraig R. Timoney, Stefan Schoeche, Daniel Schmidt, Will Parkin, Aron Cepler, Ilya Osherov, Amit Godel, Igor Turovets

Journal title: Metrology, Inspection, and Process Control XXXIX

Journal publisher: SPIE

Published year: 2025

DOI identifier: 10.1117/12.3051497