Cryogenic behavior of high-permittivity gate dielectrics: The impact of atomic layer deposition temperature and the lithographic patterning method

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Authors: Alessandro Paghi, Sebastiano Battisti, Simone Tortorella, Giorgio De Simoni, Francesco Giazotto

Journal title: Journal of Applied Physics

Journal number: 137

Journal publisher: American Institute of Physics

Published year: 2025

DOI identifier: 10.1063/5.0250428

ISSN: 0021-8979