Optimized dose modulation for controlled greyscale electron beam lithography for negative tone resist

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Authors: Olli Ovaskainen; Tian-Long Guo; Matthieu Roussey

Journal title: Applied Surface Science

Journal publisher: Elsevier B.V.

Published year: 2025

DOI identifier: 10.1016/J.APSUSC.2025.163638

ISSN: 1873-5584